NAGASE's Lift-off photoresists that develop
Unique and
Special shapes
are available.
NAGASE’s Lift-off Resist
Our company has developed distinctive and unique photoresists (photosensitive materials) for the lift-off process.
The lift-off process has the advantage of eliminating the need for a wiring formation process
using metal etching treatment, contributing to process shortening and reducing the materials used.
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g/i line exposure
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Shape processing
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Ease of peeling Residue
removability
USE
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Market
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Device
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Method
SERVICE
With our many years of experience in resist material development,we can offer you the microfabricated shapes of resist that you truly require, process by process.
In particular, we offer a range of products with ideal properties for the lift-off process.
About Nagase ChemteX
We create new value using the power of chemistry,
which draws out the characteristics of materials,
and the technology that supports it.
That is us, Nagase ChemteX.